Biography:Dr. Michael Steigerwald has a deep history in leadership roles, specifically within the field of nanotechnology and advanced scientific systems. He assumed the position of CEO at Raith Group, a global leader in nanofabrication and characterization systems. Raith has a strong reputation for innovation in critical industries such as semiconductor technology, quantum technologies, and materials science.

Before joining Raith, Dr. Steigerwald held a variety of management positions, most recently as Senior Director Engineering at US-based KLA, a leading manufacturer of wafer and reticle defect inspection systems for semiconductor production; prior to that he had been General Manager, Ion Microscopy Innovation Center, part of the scientific optics company Carl Zeiss in Peabody, USA, and Senior Manager Research & Development at Carl Zeiss NTS in Oberkochen, Germany.

Abstract:RAITH is the global market and technology leader in maskless nanofabrication systems and characterization solutions. With our unique combination of high-precision products, integrated solutions, and proprietary technologies, we drive innovation and accompany a wide variety of industries and applications. In our speech „Mastering for Nanoimprint“ we introduce our company to the audience and present our solutions along the nanoimprint process from design to mass production. Focusing on mastering with electron beam- and laser beam lithography, automated 2D metrology and process control and potential 3D analysis methods. 

Biography:Stella W. Pang is a Chair Professor and the Director of the Center for Biosystems, Neuroscience,

and Nanotechnology of the Department of Electrical Engineering, City University of Hong Kong,

China. She has over 400 technical articles, book chapters, and invited presentations. She has

ten patents granted in nanotechnology and microsystems and four pending. Her research

interests include nanofabrication technology for biomedical, microelectromechanical, THz and

metadevices. Prof. Pang is a Fellow of IEEE, ECS, AVS, and HKIE.

Biography:He jointed Matsushita Electric Co. at 1981 and developed fine lithography processes at Semiconductor research center.

At 1996, he became associate professor of mechanical system engineering at Osaka Prefecture University and started to research on nanoimprint lithography from 1998.  He promoted to be professor of department of physics and electronics engineering of Osaka Prefecture University at 2004. His research interest lies on micro and nano lithography and his special field is simulation and modeling in the fields of photo, electron and nanoimprint lithography.

He retired Osaka Prefecture University at 2022 and he is now research fellow of Osaka Metropolitan University (Established merging Osaka Prefecture University and Osaka City University in 2022).

He was a chair of Nanoimprint technology workshop of Japan society of applied physics and a member of international committee of nanoimprint and nano print conference and international committee of micro and nano engineering conference.

He is a fellow of the Japan society of applied physics.

Abstract:In nanoimprinting, the resin filling process into the mold pattern and the mold release process are essential processes.

In this talk, basic mechanisms from a macroscopic standpoint and from a molecular-level perspective, discussed contrasting simulations based on continuum dynamics and molecular dynamics, and experimental works.

In the discussions, the ultimate resolution or defects elimination will be demonstrated.

Also, the mold release process for the tilted diffraction grating, which is a characteristic structure of AR/VR devices, will be introduced, as well as the results of analysis on the release method and material properties.

Biography:Patrik Lundström is the Chief Executive Officer of Obducat Group. He holds an MSc in Business Administration from Lund University. Patrik Lundström has more than 25 years’ experience from electronics and semiconductor industry with focus on management, sales, R&D as well as manufacturing. Patrik joined Obducat in 2000 and was appointed CEO in 2002. Before joining Obducat Patrik worked at Meget AB (now part of Assa Abloy), a leading player within the RFID industry. Early on Patrik worked with electronics manufacturing having the responsibility for a lithography department.

Abstract:The presentation introduces the prospect research, innovation and application of micro-nano intelligent manufacturing.

The photonics, optics and display industry have been developed rapidly in past decade of the century. There are great demands on micro/nano manufacturing which is the fundamental path to promote the innovation of the metaverse, planar imaging and flexible meta-material industries.

The essential issue of micro/nano intelligent manufacturing is the digitization of light field, patterning, and replication capabilities. After years of efforts, our team has established a Micro/nano Intelligent Manufacturing Platform(MNIMP) on the large-format substrates. The bottleneck of real-time processing algorithm for massive data of 100Tb, digital patterning   and flexible micro/nano-replication with smart-identification has been broken through based on the  digital UV 3D lithographic equipment with network computing system and roll-to-roll multi-layer-alignment nanoimprinting lithography equipment. The MNMIP enables the further innovation of glasses-free 3D display, augmented reality(AR), planar imaging devices and flexible metamaterials, and is becoming a powerful engine for optoelectronics, light-field computation imaging, and the metaverse.

Biography：Dr. Ran Ji, CEO and founder of Qingdao Germanlitho Co., Ltd in Qingdao. He has a master’s degree from the RWTH Aachen University and Ph.D degree of the Max Planck Institute of Microstructural Physics, Halle University in Germany. He has more than 20 years’ experiences in micro and nanofabrication, especially nanoimprint technologies. In 2015, he founded Qingdao Germanlitho Co., Ltd. (青岛天仁微纳), focusing in providing advanced NIL equipments and total solutions from R&D to mass production levels. GermanLitho is now the world leading NIL equipment supplier and has dominated market share in China.

Abstract:Diffractive optical structures, such like DOEs, diffusers, optical gratings, have been used more and more on consumable electronic devices since the second half of 2017. On one hand, the fundamental research of nanoimprint lithography (NIL) is quite developed from different aspects, machines, materials, masters and processes, in last decades; on the other hand, NIL has many unique advantages in mass production of sub-wavelength structures or 3D shaping. One of the most promising applications of NIL in mass production is to produce AR waveguide surface relief gratings.

In this talk, we will share our recent industrial application cases in AR waveguide productions and the market and technology trends.

Biography: Dr. DU Kaikai is from Moldnano (Hangzhou) Technology Co., Ltd. Dr. Du is focused on the design and fabrication of micro-nano optical devices. He is the co-founder and CEO of Moldnano, which is the first company in China to provide with AR waveguide hard masters. He has developed NIL masters with slanted grating, blazed grating and gradual depth gratings for AR waveguide, accelerating the progress of AR market. His interested areas also contain meta-optics, DOE and Fresnel lenses, helping with the miniaturization and performance of optical devices and equipment.

Abstract: AR is the next generation of mobile computing platform because of its ability to combine virtual images with the real world. AR is last wearable products and the best carrier of AI computing. It attracts great interests from both academic community and industrial community. There are many optical solutions for AR devices including Birdbath, freeform lens, reflective waveguide and diffractive waveguide. Diffractive waveguide is the potential choice of consumer device considering its optical performance, productivity and light weight. However, consumer devices demand extreme weight and thickness and rainbow effect is unacceptable. By applying semi-insulated type SiC as the substrate of AR waveguide, the grating period can be selected under 300nm, decreasing the rainbow effect. By using the high refractive index of SiC, a low refractive index protecting layer can be adopted on the waveguide, resulting in the ultra thin and light waveguide. The Fresnel prescription lenses are adopted for the vision correction to decrease the thickness and cost. Besides, the SiC waveguide with designed film layers can help with heat dissipation to reduce the risk of overheat crash of light engine. 

Biography:

Master’s degree from Institute of Mechanical Engineering, National Chung Hsing University

MIC Precision process equipment development engineer

MIC Vacuum and plasma application technology researcher

MIC Photo lithography and imprinting application equipment development team manager

Abstract:

Micro lens array components are widely used in optical or display products, MIC provides a method and related process equipment for quickly designing and manufacturing micro lens array components, we offer a simple production program planning and flexible equipment solution, provide users with more convenient fabricate micro structure and production.

Biography:Su Shen,graduated from the Department of Optoelectronic Information Engineering at Zhejiang University, focuses on research and commercialization of micro/nano optical devices and nanoimprinting lithography technology. To date, he has published over 70 academic papers in related fields, applied for more than 40 patents, and received multiple national and provincial science and technology awards. His achievements in nanoimprinting technology have attracted industrial investment, leading to its successful application in the mass production of decorative films for electronic products. Additionally, he has combined microlens array imaging technique with nanoimprinting processes, which has been widely adopted by well-known domestic suppliers in the electronics industry. In the development of flexible micro/nano structure devices, he has significantly improved the external quantum efficiency of organic light-emitting devices, and his flexible metal mesh technology has been successfully applied in high-performance, large-format electromagnetic shielding and transparent touch devices.

Abstract:Grayscale lithography and nanoimprinting lithography are gaining increasing attention in the fabrication of functional devices due to their lightweight and high integration features. By designing device structures based on physical principles, 3D structure molds can be fabricated using grayscale lithography. When combined with the low-cost, high-volume advantages of nanoimprint technology, it enables the realization of many novel optoelectronic devices that were previously unimaginable. This presentation will focus on light field imaging devices as the main case study, introducing the core research achievements of the speaker and their team in this field, as well as their applications in the industry.

Biography：Dr. Bernd Dielacher is business development manager at EV Group (EVG) where he evaluates global market trends and develops growth opportunities for EVG’s bonding, lithography and nanoimprint businesses with a particular focus on the MEMS, biomedical technology and power device market.

Bernd holds a master’s degree in Microelectronics from Vienna University of Technology and received a PhD in Biomedical Engineering from ETH Zurich.